Glass Materials Technology

Glass

We have successfully developed and launched a number of new glass products in the field of building and automotive applications as well as glass substrates for flat panel displays . Based on the technological expertise cultivated through a series of new product development, we continue to strengthen specialty glass materials technology and production engineering technology for thin glass, which are crucial for the realization of highly promising next-generation displays and info-communication devices.

Using proprietary material design technologies, AGC provides products that meet customers' various needs.

Glass Materials Technology

Glass substrates for TFT LCDs
Glass substrates based on proprietary technology support large screen, high-definition displays.

Using proprietary technology based on the float method, we mass-produce large-sized substrates of 2 meters square or more, which enable production of multiple panels from a single large sheet of mother glass. We have also realized the superior dimensional stability required in the low-temperature polysilicon (LTPS) process for high-definition displays.

Glass substrates

Glass inspection
 

With our thorough knowledge of sensing technology, we conduct stringent product evaluation using laser-scanning glass-quality sensors. This enables us to maintain a reliable supply of high-quality glass substrates.

Glass inspection

Frit
Prioritizing preservation of the global environment, we are proactively promoting lead-free frit.

AGC's frit and paste materials are manufactured through an integrated production system from glass melting, crushing, classifying to pasting, as well as based on the glass composition/design and analytical capabilities that we developed over years. We respond to a wide range of frit usages, including plasma displays, adhesive for ceramics and glass/metal and multilayer substrates to enable excellent electric properties even at high frequencies. Also, under our supply system, products can be provided in the form of frit, paste or green sheet according to customers' needs. Today, we actively promote lead-free frit in response to the recent environmental regulations concerning electronic parts.

Frit

Reflective (mirror) substrates for concentrating solar thermal power systems
Advanced glass materials technologies for high-performance reflectors

Concentrating solar thermal power systems utilize sunlight collected through reflective mirrors to produce steam, which, in turn, is used to generate electricity. Like solar cells, this system does not produce carbon dioxide. We offer special, highly-transparent glass substrates that were developed as the reflective glass panels for concentrating solar thermal power systems.

Reflective (mirror) substrates for concentrating solar thermal power systems

Micro glass lenses
High-precision, aspherical glass lenses developed with our proprietary optical glass technologies.

Precision aspherical glass lenses are used as highly-functional components and incorporated into many products such as digital cameras and cell phone cameras. We develop businesses centering on optical materials/components and lens processing technologies, and respond to the needs of various fields.

Glass substrates

Synthetic quartz glass
Realization of excellent UV transmission and homogeneity.

Synthetic quartz glass, which is created using advanced glass production technologies, has excellent properties such as low thermal expansion coefficients, high thermal resistance, high UV transmission, and high chemical durability. We supply quartz glass-based substrates for photomasks and lens materials utilizing in excimer laser steppers for the most advanced lithography that requires ultra-high precision and high stability.

Glass substrates

EUVL mask blanks
AGC's integrated technological development from substrate materials to film deposition supports the mass-production of next-generation semiconductor devices.

EUVL mask blanks are ultra-low thermal expansion glass plates with optical films that are used for extreme ultra-violet lithography (EUVL) suitable for the manufacturing of semiconductor devices with 32nm node and smaller. We are developing glass materials, polishing processes, film deposition processes, cleaning processes and metrology, in order to meet required stringent specifications such as ultra-low thermal expansion (0+-5ppb/K), high flatness (50nm over 142mm square), zero defects as small as 30nm in size and >65% reflectance at EUV light (wavelength = ~13.5nm).

Glass substrates

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